NOVOLAK RESIN CONTAINING HEXAFLUOROISOPROPANOL GROUP, METHOD FOR PRODUCING SAME, AND COMPOSITION OF SAME

摘要

Disclosed is a novolak resin containing a repeating unit represented by the general formula (1). R1is a hydrogen atom or an alkyl group which is C1-4 straight-chain or C3-4 branched-chain, and some or all hydrogen atoms in the alkyl group may be replaced with a fluorine atom; R2 is a hydrogen atom, a phenyl group, an alkyl group which is C1-10 straight-chain or C3-10 branched-chain, or an alkyl group having a C3-10 cyclic structure, and some or all hydrogen atoms in the phenyl group and the alkyl group may be replaced with fluorine atoms; each of a and b is independently an integer of 1-3, and these are defined as 2≦̸a+b≦̸4; and d is an integer of 0-2. This novolak resin has high dissolution rate in the alkaline development solution in addition to the heat resisting property which is a property of phenolic resin.