发明名称 Resist composition, method of forming resist pattern and polymeric compound
摘要 A resist composition including a resin component which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the resin component including a resin component having a structural unit represented by a general formula (a0-0-1) shown below;;in which R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R0-1 represents a single bond or a divalent linking group, each of R2, R3 and R4 independently represents a linear, branched or cyclic alkyl group which may have a non-aromatic substituent, or R3 and R4 may be bonded to each other to form a ring together with the sulfur atom, and X represents a non-aromatic divalent linking group or a single bond.
申请公布号 US9104101(B2) 申请公布日期 2015.08.11
申请号 US201213402820 申请日期 2012.02.22
申请人 Tokyo Ohka Kogyo Co., Ltd. 发明人 Matsuzawa Kensuke;Iwashita Jun;Komuro Yoshitaka;Arai Masatoshi
分类号 G03F7/004;G03F7/38;C08F220/18;C08F220/28;C08F220/38;C08F228/06;G03F7/039;G03F7/20 主分类号 G03F7/004
代理机构 Knobbe Martens Olson & Bear LLP 代理人 Knobbe Martens Olson & Bear LLP
主权项 1. A resist composition for use with EUV or EB, the composition comprising a resin component (A) which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resin component (A) comprising a resin component (A1) having a structural unit (a0) having no aromaticity in the cation moiety, wherein the structural unit (a0) is represented by a general formula (a0-0-1) shown below: wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R0-1 represents a single bond or a divalent linking group, each of R2, R3 and R4 independently represents a linear, branched or cyclic alkyl group which may have a non-aromatic substituent, or alternatively R3 and R4 may be bonded to each other to form a ring together with a sulfur atom in the general formula, and X represents a non-aromatic divalent linking group or a single bond, and R2—X—S+(R3)(R4) in the general formula (a0-0-1) is represented by a general formula (I-1), (I-2), (I-3) or (I-4) shown below: wherein, u represents an integer of 1 to 3, R5 represents an alkylene group which may have a non-aromatic substituent, R6 represents an alkyl group which may have a non-aromatic substituent, R7 represents a hydroxyl group, R8 represents an unsubstituted alkyl group, and each of R9a to R9c independently represents a linear or branched alkyl group of 5 to 15 carbon atoms.
地址 Kawaski-shi JP