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发明名称
SUBSTRATING PROCESSING METHOD
摘要
<p>기판 가공 방법이 제공되며, 제1 기판의 일면에 산화물을 진공증착하는 단계, 제2 기판의 일면에 산화물을 진공증착하는 단계, 그리고 제1 기판의 산화물 증착 면과 제2 기판의 산화물 증착 면을 서로 마주보도록 접합하여 가열하는 단계를 포함한다.</p>
申请公布号
KR101531033(B1)
申请公布日期
2015.06.23
申请号
KR20130108733
申请日期
2013.09.10
申请人
发明人
分类号
H01L21/20
主分类号
H01L21/20
代理机构
代理人
主权项
地址
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