发明名称 |
SUBSTRATE FOR SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING SUBSTRATE FOR SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate for a semiconductor device capable of suppressing breakage of a semiconductor chip caused by thermal expansion coefficient difference, and also to provide a semiconductor device, a method of manufacturing the substrate for the semiconductor device and a method of manufacturing the semiconductor device. ! SOLUTION: A substrate for a semiconductor device includes an insulation ceramic substrate, and a metal layer for a wiring circuit provided on the insulation ceramic substrate. The metal layer for the wiring circuit contains a composite material of copper and molybdenum or a composite material of copper and tungsten. ! COPYRIGHT: (C)2015,JPO&INPIT |
申请公布号 |
JP2015106648(A) |
申请公布日期 |
2015.06.08 |
申请号 |
JP20130248123 |
申请日期 |
2013.11.29 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
YOSHIDA KATSUTO ; SAKAMOTO TOSHIHIRO ; KURISU KENICHI ; TSUNO TAKASHI |
分类号 |
H01L23/13;H01L23/12;H01L23/36;H05K1/09 |
主分类号 |
H01L23/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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