发明名称 SUBSTRATE FOR SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING SUBSTRATE FOR SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate for a semiconductor device capable of suppressing breakage of a semiconductor chip caused by thermal expansion coefficient difference, and also to provide a semiconductor device, a method of manufacturing the substrate for the semiconductor device and a method of manufacturing the semiconductor device. ! SOLUTION: A substrate for a semiconductor device includes an insulation ceramic substrate, and a metal layer for a wiring circuit provided on the insulation ceramic substrate. The metal layer for the wiring circuit contains a composite material of copper and molybdenum or a composite material of copper and tungsten. ! COPYRIGHT: (C)2015,JPO&INPIT
申请公布号 JP2015106648(A) 申请公布日期 2015.06.08
申请号 JP20130248123 申请日期 2013.11.29
申请人 SUMITOMO ELECTRIC IND LTD 发明人 YOSHIDA KATSUTO ; SAKAMOTO TOSHIHIRO ; KURISU KENICHI ; TSUNO TAKASHI
分类号 H01L23/13;H01L23/12;H01L23/36;H05K1/09 主分类号 H01L23/13
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