发明名称 RF plasma reactor having a distribution chamber with at least one grid
摘要 A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.
申请公布号 US9045828(B2) 申请公布日期 2015.06.02
申请号 US200711877419 申请日期 2007.10.23
申请人 TEL Solar AG 发明人 Turlot Emmanuel;Chevrier Jean-Baptiste;Schmitt Jacques;Barreiro Jean
分类号 C23C16/507;C23C16/509;H01J1/00;C23F1/00;C23C16/455;H01J37/32;C23C16/06;C23C16/22 主分类号 C23C16/507
代理机构 Crowell & Moring LLP 代理人 Crowell & Moring LLP
主权项 1. A plasma reactor comprising a reactor vessel and therein a pair of electrodes consisting of spaced apart and oppositely disposed metallic surfaces defining a plasma discharge space, at least one of said metallic surfaces being the surface of a metallic plate having a multitude of gas feed openings therethrough and through said metallic surface towards said discharge space and from a distribution chamber extending along said plate opposite said discharge space; said distribution chamber having a wall opposite and distant from said plate and comprising a gas inlet arrangement with a multitude of gas inlet openings distributed along said wall and connected to at least one gas feed line to said reactor, wherein the plasma reactor comprises means for increasing the distribution of gas feed to the plasma discharge space along the peripheral border area of the plasma discharge space, said means comprising: said wall comprising a lateral rim portion extending towards and beyond the periphery of said plate and distant therefrom, said distribution chamber communicating by an opening arrangement with the interspace between said lateral rim portion and said periphery of said plate, said opening arrangement extending substantially parallel to said plate and substantially perpendicularly to said rim portion.
地址 Truebbach CH