| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an apparatus capable of suppressing reduction in attraction force of an electrostatic chuck, and suppressing residual charge on a surface of the electrostatic chuck.SOLUTION: There is provided a method of attracting an object to be attracted onto a placing table. The placing table, in a processing apparatus for processing a body to be processed in a space that can be decompressed, is provided in a processing container that defines the space. In addition, the processing apparatus is a plasma processing apparatus, for example. The method includes a step of placing the object to be attracted on an electrostatic chuck of the placing table, and a step of applying three AC voltages having phases different from one another to three electrodes of the electrostatic chuck, respectively.</p> |
