发明名称 NONVOLATILE MEMORY DEVICE
摘要 A nonvolatile memory device may include: an isolation layer formed in a substrate and defining an active region; a control plug formed over the isolation layer; a floating gate formed over the substrate and including a plurality of fingers adjacent to the control plug with a gap provided therebetween; and a charge blocking layer formed on sidewalls of the floating gate so as to fill the gap. The control plug may include: a first control plug formed between the plurality of fingers and having sidewalls facing inner walls of the fingers; and a second control plug formed outside the floating gate and having sidewalls facing outer walls of the fingers.
申请公布号 US2015145019(A1) 申请公布日期 2015.05.28
申请号 US201514612014 申请日期 2015.02.02
申请人 SK hynix Inc. 发明人 PARK Sung-Kun
分类号 H01L27/115;H01L29/423 主分类号 H01L27/115
代理机构 代理人
主权项 1. A nonvolatile memory device comprising: an isolation layer formed in a substrate and defining an active region; a control plug formed over the isolation layer; a floating gate formed over the substrate and comprising a plurality of fingers adjacent to the control plug with a gap provided therebetween; and a charge blocking layer formed on sidewalls of the floating gate so as to fill the gap, wherein the control plug comprises: a first control plug formed between the plurality of fingers and having sidewalls facing inner walls of the fingers; anda second control plug formed outside the floating gate and having sidewalls facing outer walls of the fingers.
地址 Gyeonggi-do KR