| 摘要 |
A gas dispersion apparatus for use with a process chamber, comprising: a quartz body having a top, a ring coupled to a bottom surface of the top and a bottom plate having dispersion holes coupled to the ring opposite the top; a plurality of quartz plates disposed between the top and the bottom plate, wherein the plurality of plates are positioned above one another and spaced apart to form a plenum above each of the plurality of plates and the bottom plate; a plurality of quartz tubes to couple the plenums to the plurality of dispersion holes, each of the plurality of quartz tubes having a first end disposed within one of the plenums and having a second end coupled to one of the dispersion holes; and a plurality of conduits disposed through the top, wherein each of the plurality of conduits is coupled to one of the plenums. |
| 主权项 |
1. A gas dispersion apparatus to provide gases to a process chamber, comprising:
a quartz body having a top, a ring coupled to a bottom surface of the top, and a bottom plate, having a plurality of gas dispersion holes, coupled to the ring opposite the top; a plurality of quartz plates disposed between the top and the bottom plate, wherein the plurality of quartz plates vertically arranged and spaced apart to form a plenum above each of the plurality of quartz plates and the bottom plate; a plurality of quartz tubes to couple the plenums to the plurality of dispersion holes, each of the plurality of quartz tubes having a first end disposed within one of the plenums and having a second end coupled to one of the plurality of dispersion holes; and a plurality of conduits disposed through the top of the body, wherein each of the plurality of conduits is coupled to one of the plenums to provide a process gas to the plenums. |
