发明名称 PRINTHEAD SUBSTRATE, METHOD OF MANUFACTURING THE SAME, PRINTHEAD, AND PRINTING APPARATUS
摘要 A method of manufacturing a printhead substrate, including forming a metal pattern, including a portion forming a pair of electrodes, on an insulating member, forming a conductive film which covers the insulating member and the metal pattern, including a first portion forming a temperature detection element and a second portion except for the first portion, etching the second portion so as to form the pair of electrodes, and etching the first portion so as to form the temperature detection element which is connected to the pair of electrodes, wherein an etching amount in the etching the second portion is larger than a thickness of the conductive film, and an etching amount in the etching the first portion is smaller than the etching amount in the etching the second portion.
申请公布号 US2015109370(A1) 申请公布日期 2015.04.23
申请号 US201414507959 申请日期 2014.10.07
申请人 CANON KABUSHIKI KAISHA 发明人 Chowdhury Ershad Ali;Kimura Takayuki;Makino Kenji
分类号 B41J2/16;B41J2/14 主分类号 B41J2/16
代理机构 代理人
主权项 1. A method of manufacturing a printhead substrate which includes an electrothermal transducer, an insulating member, a pair of electrodes arranged on the insulating member, and a temperature detection element arranged on the insulating member, connected to the pair of electrodes, and configured to detect a temperature of the electrothermal transducer, comprising steps of: forming, on the insulating member, a metal pattern which includes a portion forming the pair of electrodes such that a first region and a second region of the insulating member are not covered by the metal pattern, the first region being defined as a region where the temperature detection element is to be formed and the second region being adjacent to the first region; forming a conductive film to cover the insulating member and the metal pattern; forming a resist pattern which covers a first portion of the conductive film, the first portion being arranged on the first region and on the second region; etching a second portion except for the first portion of the conductive film using the resist pattern; and etching the first portion of the conductive film to form the temperature detection element having a shape for connecting portions of the conductive that are to be the pair of electrodes, wherein an etching amount in the step of etching the second portion is larger than a thickness of the conductive film, and an etching amount in the step of etching the first portion is smaller than the etching amount in the step of etching the second portion.
地址 Tokyo JP