| 摘要 |
<p>PROBLEM TO BE SOLVED: To solve problems in an exposure process after a contour of a piezoelectric element is formed by etching.SOLUTION: Prior to etching a contour, a photoresist film 54 is exposed to transfer an electrode pattern to form a latent image portion 55 (shown in Fig.6[I]); the latent image portion 55 is developed after etching the contour; and an electrode is formed by a lift-off process using the photoresist film 54 used in etching the contour. By this method, no exposure is required after etching the contour, which solves all the problems caused by exposure after etching the contour.</p> |
