发明名称 SINGLE PHOTON SOURCE DIE AND METHOD OF MANUFACTURING THE SAME
摘要 A single photon source die includes a first semiconductor layer, a plurality of columnar structures formed on the first semiconductor layer, a second semiconductor layer formed on the columnar structures. Each columnar structure includes a bottom layer, a single photon point layer and a connecting layer. The single photon point layer includes a plurality of single photon points.
申请公布号 US2015069323(A1) 申请公布日期 2015.03.12
申请号 US201414480868 申请日期 2014.09.09
申请人 ADVANCED OPTOELECTRONIC TECHNOLOGY, INC. 发明人 CHIU CHING-HSUEH;LIN YA-WEN;TU PO-MIN;HUANG SHIH-CHENG
分类号 H01L33/00;H01L33/20;H01L33/32;H01L33/04;H01L33/12 主分类号 H01L33/00
代理机构 代理人
主权项 1. A method of manufacturing a single photon source die comprising: providing a precursor comprising a first semiconductor layer, a prep layer and a connecting layer, the prep layer and the connecting layer being formed on the first semiconductor layer successively; etching the connecting layer, the prep layer and a part of the first semiconductor layer to form a plurality of wedge structures and a surface defined on the first semiconductor and between the wedge structures; etching the wedge structures to form a plurality of columnar structures, each columnar structures having a flank; annealing a semi-finished product obtained from above; forming a middle layer on the surface of the first semiconductor layer and the flank of the each columnar structure; forming a second semiconductor layer on the columnar structures; and forming two electrodes on the second semiconductor layer and the first semiconductor layer respectively.
地址 Hsinchu Hsien TW