发明名称 |
SINGLE PHOTON SOURCE DIE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
A single photon source die includes a first semiconductor layer, a plurality of columnar structures formed on the first semiconductor layer, a second semiconductor layer formed on the columnar structures. Each columnar structure includes a bottom layer, a single photon point layer and a connecting layer. The single photon point layer includes a plurality of single photon points. |
申请公布号 |
US2015069323(A1) |
申请公布日期 |
2015.03.12 |
申请号 |
US201414480868 |
申请日期 |
2014.09.09 |
申请人 |
ADVANCED OPTOELECTRONIC TECHNOLOGY, INC. |
发明人 |
CHIU CHING-HSUEH;LIN YA-WEN;TU PO-MIN;HUANG SHIH-CHENG |
分类号 |
H01L33/00;H01L33/20;H01L33/32;H01L33/04;H01L33/12 |
主分类号 |
H01L33/00 |
代理机构 |
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代理人 |
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主权项 |
1. A method of manufacturing a single photon source die comprising:
providing a precursor comprising a first semiconductor layer, a prep layer and a connecting layer, the prep layer and the connecting layer being formed on the first semiconductor layer successively; etching the connecting layer, the prep layer and a part of the first semiconductor layer to form a plurality of wedge structures and a surface defined on the first semiconductor and between the wedge structures; etching the wedge structures to form a plurality of columnar structures, each columnar structures having a flank; annealing a semi-finished product obtained from above; forming a middle layer on the surface of the first semiconductor layer and the flank of the each columnar structure; forming a second semiconductor layer on the columnar structures; and forming two electrodes on the second semiconductor layer and the first semiconductor layer respectively. |
地址 |
Hsinchu Hsien TW |