| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pattern formation method and a pattern formation body, suitable for forming a three-dimensionally structured fine patterns having a plurality of steps. <P>SOLUTION: In the pattern formation method and the pattern formation body having the three-dimensionally structured fine patterns with the plurality of steps, the pattern formation method includes: forming a hard mask layer 12 of a first layer, an etch stopper layer 13 and a hard mask layer 22 of a second layer; patterning the hard mask layers and the etch stopper layer; and performing anisotropic etching on the substrate 11, using the hard mask layers as etching masks. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
