| 摘要 |
Provided is a microlens fabrication method, whereby, upon a lens material layer which is formed upon a substrate without a melt step being included therein, a mask layer having a pattern shape is formed, dry etching is carried out upon the mask layer and the lens material layer, and the pattern shape of the mask layer is transferred to the lens material layer, forming microlenses. With a melt step of melting by heat flow of a photoresist which forms a mask material not being included therein, an inter-pattern gap for lens shaping by the melt step becomes unnecessary, thus narrowing the mask inter-pattern gap, allowing eliminating a line width misalignment. An inter-pattern fusing associated with the melt step also does not arise, and thus, it is possible to enlarge a mask pattern formation process window. The etching characteristics of the pitch direction and the diagonal direction (the balance between deposition generation and etching progress) are additionally refined, a gapless condition is improved, and it is possible to shorten the etching time. |
