发明名称 NON-VOLATILE MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME
摘要 According to an embodiment, a non-volatile memory device includes a first wiring provided on an underlayer, a first memory cell array provided on the first wiring and including a plurality of memory cells, a first select element including a first control electrode provided between the first wiring and the first memory cell array. The device also includes a second wiring provided at the same level as the first wiring and electrically connected to the first control electrode, and a first plug electrically connecting the first control electrode and the second wiring, one end of the first plug being in contact with the second wiring, and a side surface of the first plug being in contact with the first control electrode.
申请公布号 US2015062993(A1) 申请公布日期 2015.03.05
申请号 US201414150193 申请日期 2014.01.08
申请人 Kabushiki Kaisha Toshiba 发明人 TANAKA Toshiharu
分类号 G11C5/06;H01L21/768 主分类号 G11C5/06
代理机构 代理人
主权项 1. A non-volatile memory device comprising: a first wiring provided above an underlayer; a first memory cell array provided above the first wiring and including memory cells; a first select element including a first control electrode provided between the first wiring and the first memory cell array; a second wiring provided at the same level as the first wiring, and electrically connected to the first control electrode; and a first plug electrically connecting the first control electrode and the second wiring, one end of the first plug being in contact with the second wiring, and a side surface of the first plug being in contact with the first control electrode.
地址 Minato-Ku JP