发明名称 Method for manufacturing substrate and substrate manufacturing device
摘要 <p>A film pattern comprised of a film material is formed by repeating a step of shooting a droplet of the film material on the position corresponding to a pixel to be shot on the surface of an underlying substrate and a step of hardening the film material that was shot onto the underlying substrate. The planar shape of the film pattern is defined by image data comprised of multiple two-dimensionally distributed pixels. The pixel to be shot is a part of pixels selected from the multiple pixels in a solid area to be coated with the film material on the surface of the underlying substrate. A film pattern covering the entire solid area is formed by hardening the film material after the film material that was shot on the position corresponding to the pixel to be shot has expanded in the in-plane direction up to the area corresponding to the pixels not selected as the pixels to be shot.</p>
申请公布号 KR101497563(B1) 申请公布日期 2015.03.02
申请号 KR20137034908 申请日期 2012.06.20
申请人 发明人
分类号 B05C5/00;B05C9/12;B05D1/26;H05K3/28 主分类号 B05C5/00
代理机构 代理人
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