| 发明名称 |
PLASMONIC INTERFACE AND METHOD OF MANUFACTURING THEREOF |
| 摘要 |
A method of manufacturing a layered material stack that includes a plasmonic interface between a plasmonic material and optical waveguide material is disclosed. The method includes providing a substrate layer, disposing a layer of plasmonic material on the substrate layer, depositing a metal constituent of an optical waveguide material directly onto the layer of plasmonic material, and anodizing the metal constituent of the optical waveguide material to form an optically transparent oxide of the metal constituent configured to couple light into the layer of plasmonic material, with the optically transparent oxide of the metal constituent forming an optical waveguide structure. |
| 申请公布号 |
US2015055924(A1) |
申请公布日期 |
2015.02.26 |
| 申请号 |
US201313970852 |
申请日期 |
2013.08.20 |
| 申请人 |
General Electric Company |
发明人 |
Keimel Christopher Fred;Hewgley John Brian;Becerra Juan Jose |
| 分类号 |
G02B6/02;C25D11/26;C25D11/04;B32B37/12;B32B37/24 |
主分类号 |
G02B6/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of manufacturing a layered material stack comprising:
providing a substrate layer; disposing a layer of plasmonic material on the substrate layer; depositing a metal constituent of an optical waveguide material directly onto the layer of plasmonic material; and anodizing the metal constituent of the optical waveguide material to form an optically transparent oxide of the metal constituent configured to couple light into the layer of plasmonic material, the optically transparent oxide of the metal constituent forming an optical waveguide structure. |
| 地址 |
Schenectady NY US |
