| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a continuous electric plating device capable of maintaining an interval between electrodes to a range which is not too wide or too narrow, and reducing a range of current density distribution in a longitudinal direction (flow direction of a material to be plated) of the electrode, and coping with making an electrode thin.SOLUTION: A power feeding part 7, to which power is fed via a power feeding bar 8 from the vicinity of its lower end, is provided on an electrode 5 which is an anode of the continuous electric plating device, and difference of an electric power resistance value in a shortest path (1) and a longest path (2) of current is reduced, for making current density distribution uniform. In addition, a lath electrode is used to the electrode 5, for suppressing occurrence of a phenomenon that a material to be plated is absorbed to the electrode.</p> |
