发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF
摘要 The invention relates to a photosensitive resin composition that has the advantages of high developability, good hardness, and good sputtered resistance. The invention also provides a method for manufacturing a color filter, color filter and a liquid crystal display device. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound containing an ethylenically unsaturated group (B), a photoinitiator (C), an organic solvent (D), a pigment (E), and a compound (F).
申请公布号 US2015041735(A1) 申请公布日期 2015.02.12
申请号 US201414445764 申请日期 2014.07.29
申请人 CHI MEI CORPORATION 发明人 WANG DUAN-CHIH;HSU JUNG-PIN
分类号 G02B1/04;G02F1/1335;G02B5/23 主分类号 G02B1/04
代理机构 代理人
主权项 1. A photosensitive resin composition for a color filter comprising: an alkali-soluble resin (A); a compound containing an ethylenically unsaturated group (B); a photoinitiator (C); an organic solvent (D); a pigment (E); and a compound (F) represented by Formula (I); wherein: R1 is selected from the group consisting of hydrogen, halogen, a nitro group, a hydrocarbyl group and R2 and R3 are independently selected from the group consisting of (CR7R8)n, CR9R10, CR7R8CR9R10 and CR9R10CR7R8; n is 0, 1 or 2; R7 and R8 are independently selected from the group consisting of hydrogen, halogen and a hydrocarbyl group; either one of R9 or R10 is hydrogen and the other is an electron withdrawing group, or R9 and R10 together form an electron withdrawing group; R4 and R5 are independently selected from the group consisting CH and CR11; R11 is an electron withdrawing group; the dotted line indicates the presence or absence of a bond; X1 is a CX2X3 group where the dotted line bond to which it is attached is absent; X1 is a CX2 group where the dotted line bond to which it is attached is present; Y1 is a CY2Y3 group where the dotted line bond to which it is attached is absent; Y1 is a CY2 group where the dotted line bond to which it is attached is present; X2, X3, Y2 and Y3 are independently selected from the group consisting hydrogen, fluorine, a hydrocarbyl group, an alkyl group, an aryl group and a heterocyclic group; and R13 is C(O) or S(O)2.
地址 TAINAN CITY TW