| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a compound having high radiation-sensitivity when used as a photopolymerization initiator, and to provide a radiation-sensitive composition which gives a cured film having high radiation-sensitivity and excellent solvent resistance. <P>SOLUTION: The composition is represented by formula (1), wherein R<SP>1</SP>, R<SP>2</SP>, R<SP>3</SP>, and R<SP>4</SP>each independently represent a hydrogen atom, a halogen atom, a cyano group or a nitro group. R<SP>5</SP>represents a cyano group or a phenyl group in which some or all of hydrogen atoms are substituted with 1-12C alkoxy groups. R<SP>6</SP>and R<SP>7</SP>each independently represent a hydrogen atom, a 1-6C alkyl group, a cyclopentyl group, a cyclohexyl group or a nitrogen-containing heterocyclic group. <P>COPYRIGHT: (C)2011,JPO&INPIT |
