ETCHING PRODUCT PRODUCTION METHOD

摘要

PROBLEM TO BE SOLVED: To provide an etching product production method capable of forming an opening hole part having high aspect and having fine opening diameter.SOLUTION: An etching product production method comprises: a step S1 of forming a pattern of a mask material on a substrate; a step S2 which is an initial etching mode for forming a first stage opening part by etching of a surface of the substrate exposed by the pattern of the mask material; a step S3 which is a passivation mode for forming a protection film having resistance to wet etching by performing ion etching to a side wall of the opening hole on a Nth stage (N is a natural number); a step S4 which is an etching mode for forming an opening hole part on a N+1th stage by performing wet etching to a bottom face of the opening hole part on the Nth stage on which the protection film is formed; a step S5 for determining whether the opening hole has a desired opening hole depth or not; and a step S6 for removing the mask material and the protection film and completing formation of the opening hole parts.