| 摘要 |
A chemical vapor deposition apparatus for flat panel displays is disclosed. According to an embodiment of the present invention, a chemical vapor deposition apparatus for flat panel displays comprising: a gas distribution plate, which is arranged in a lower part of a backing plate prepared in a chamber with having a separate space part between the backing plate and the gas distribution plate, for distributing a deposition material to flat panel displays; multiple thermal expansion compensation units for a side shield, which are arranged along a side area of the gas distribution plate for shielding the separate space part, and which are connected to the gas distribution plate partially for supporting the gas distribution plate and for compensating a thermal expansion of the gas distribution plate; and multiple thermal expansion compensation units for a corner shield, which are arranged to be adjacent to a pair of side thermal expansion compensation units near to a corner area of the gas distribution plate, for shielding a corner area of the separate space part while compensating a thermal expansion of multiple side thermal expansion compensation units. |
