发明名称 |
COMPOSITION FOR PASSIVATION FILM, SEMICONDUCTOR SUBSTRATE WITH PASSIVATION FILM AND MANUFACTURING METHOD THEREOF, AND SOLAR BATTERY ELEMENT AND MANUFACTURING METHOD THEREOF |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide: a composition for a passivation film which allows a passivation film having a desired shape to be formed by a simple and convenient method, and is excellent in storage stability and compactness; a semiconductor substrate provided with a passivation film by use of the composition; a method for manufacturing the semiconductor substrate; a solar battery element; and a method for manufacturing the solar battery element.SOLUTION: A composition for a passivation film comprises: a metal alkoxide compound expressed by the general formula (I) below; water; and a hydrolysis catalyst. [In the general formula (I), M represents any of Nb, Ta, V, Y and Hf; R's are independent of each other and represent alkyl groups each having 1-8 carbon atoms, respectively; and m is an integer of 0-5.]</p> |
申请公布号 |
JP2014167961(A) |
申请公布日期 |
2014.09.11 |
申请号 |
JP20130038896 |
申请日期 |
2013.02.28 |
申请人 |
HITACHI CHEMICAL CO LTD |
发明人 |
ODA AKIHIRO;YOSHIDA MASATO;NOJIRI TAKESHI;KURATA YASUSHI;TANAKA TORU;ADACHI SHUICHIRO;HAYASAKA TAKESHI |
分类号 |
H01L21/316;C08G79/00;H01L31/04 |
主分类号 |
H01L21/316 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|