发明名称 COMPOSITION FOR PASSIVATION FILM, SEMICONDUCTOR SUBSTRATE WITH PASSIVATION FILM AND MANUFACTURING METHOD THEREOF, AND SOLAR BATTERY ELEMENT AND MANUFACTURING METHOD THEREOF
摘要 <p>PROBLEM TO BE SOLVED: To provide: a composition for a passivation film which allows a passivation film having a desired shape to be formed by a simple and convenient method, and is excellent in storage stability and compactness; a semiconductor substrate provided with a passivation film by use of the composition; a method for manufacturing the semiconductor substrate; a solar battery element; and a method for manufacturing the solar battery element.SOLUTION: A composition for a passivation film comprises: a metal alkoxide compound expressed by the general formula (I) below; water; and a hydrolysis catalyst. [In the general formula (I), M represents any of Nb, Ta, V, Y and Hf; R's are independent of each other and represent alkyl groups each having 1-8 carbon atoms, respectively; and m is an integer of 0-5.]</p>
申请公布号 JP2014167961(A) 申请公布日期 2014.09.11
申请号 JP20130038896 申请日期 2013.02.28
申请人 HITACHI CHEMICAL CO LTD 发明人 ODA AKIHIRO;YOSHIDA MASATO;NOJIRI TAKESHI;KURATA YASUSHI;TANAKA TORU;ADACHI SHUICHIRO;HAYASAKA TAKESHI
分类号 H01L21/316;C08G79/00;H01L31/04 主分类号 H01L21/316
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