发明名称 |
TRANSISTOR TUNNEL A FORT COURANT PAR AMPLIFICATION BIPOLAIRE |
摘要 |
The transistor has a source region (160), a drain region (140), and a gate electrode. A given region among the source region and the drain region includes a semiconductor zone (111) doped with a doping type. The given region includes another semiconductor zone (112) doped with another doping type. A junction is formed with the former doped zone. Another given region among the source region and the drain region includes a third semiconductor zone (113) that is doped with the former doping type. An independent claim is also included for a method for producing a transistor. |
申请公布号 |
FR2993394(B1) |
申请公布日期 |
2014.08.22 |
申请号 |
FR20120056686 |
申请日期 |
2012.07.11 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIESALTERNATIVES;CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE |
发明人 |
LE ROYER CYRILLE;CRISTOLOVEANU SORIN;WAN JING;ZASLAVSKY ALEXANDER |
分类号 |
H01L21/328;H01L29/66 |
主分类号 |
H01L21/328 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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