| 发明名称 |
VARIABLE-TEMPERATURE MATERIAL GROWTH STAGES AND THIN FILM GROWTH |
| 摘要 |
<p>A thin film of material on a substrate is formed in a continuous process of a physical vapor deposition system, in which material is deposited during a variable temperature growth stage having a first phase conducted below a temperature of about 500 °C, and material is continuously deposited as the temperature changes for the second phase to above about 800 °C.</p> |
| 申请公布号 |
WO2014127102(A1) |
申请公布日期 |
2014.08.21 |
| 申请号 |
WO2014US16204 |
申请日期 |
2014.02.13 |
| 申请人 |
VEECO INSTRUMENTS INC. |
发明人 |
DATTA, ARINDOM;CERIO, FRANK, M.;KOHLI, SANDEEP;DRUZ, BORIS, L. |
| 分类号 |
C23C16/00 |
主分类号 |
C23C16/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
