| 摘要 |
A method for depositing an atomic layer using light irradiation includes a step of depositing a thin film on a substrate by an atomic layer deposition process and a step of irradiating the thin film with light for a predetermined time during the atomic layer deposition process. A light irradiating time can be positioned, during the atomic layer deposition process, in one or more among time periods of before a process of introducing a material precursor, during the process of introducing the material precursor, between the process of introducing the material precursor and a process of introducing a reaction precursor, during the process of introducing the reaction precursor, and after the process of introducing the reaction precursor. |
