发明名称 Detection of wafer-edge defects
摘要 Apparatus for inspection of a disk, which includes a crystalline material and has first and second sides. The apparatus includes an X-ray source, which is configured to direct a beam of X-rays to impinge on an area of the first side of the disk. An X-ray detector is positioned to receive and form input images of the X-rays that are diffracted from the area of the first side of the disk in a reflective mode. A motion assembly is configured to rotate the disk relative to the X-ray source and detector so that the area scans over a circumferential path in proximity to an edge of the disk. A processor is configured to process the input images formed by the X-ray detector along the circumferential path so as to generate a composite output image indicative of defects along the edge of the disk.
申请公布号 US8781070(B2) 申请公布日期 2014.07.15
申请号 US201213570271 申请日期 2012.08.09
申请人 Jordan Valley Semiconductors Ltd. 发明人 Wormington Matthew;Ryan Paul;Wall John Leonard
分类号 G01N23/20 主分类号 G01N23/20
代理机构 D. Kligler I.P. Services Ltd. 代理人 D. Kligler I.P. Services Ltd.
主权项 1. Apparatus for inspection of a disk, which includes a crystalline material and has first and second sides, the apparatus comprising: an X-ray source, which is configured to direct a beam of X-rays to impinge on an area of the first side of the disk; an X-ray detector, which is positioned to receive and form input images of the X-rays that are diffracted from the area of the first side of the disk in a reflective mode; a motion assembly, which is configured to rotate the disk relative to the X-ray source and detector so that the area scans over a circumferential path in proximity to an edge of the disk; and a processor, which is configured to process the input images formed by the X-ray detector along the circumferential path so as to generate a composite output image indicative of defects along the edge of the disk.
地址 Migdal Haemek IL