Substrate processing apparatus

摘要

A substrate processing apparatus that forms thin films on a plurality of substrates and thermally processes the substrates, by uniformly heating the substrates. The substrate processing apparatus includes a processing chamber, a boat in which substrates are stacked, an external heater located outside of the processing chamber, a feeder to move the boat into and out of the processing chamber, a lower heater located below the feeder, and a central heater located in the center of the boat.

主权项

1. A substrate processing apparatus, comprising:
a processing chamber; a boat to house substrates; an external heater having a shape of a furnace and surrounding at least 3 sides of the processing chamber; a feeder to move the boat in and out of the processing chamber, the feeder comprising a lower heater disposed below the boat; and a central heater located in a center of the boat, wherein the external heater comprises a first heater disposed along a top surface of the processing chamber, the first heater being parallel to the top surface of the processing chamber, and wherein the center of the boat is substantially at a center of a height between a top and a bottom of the boat, the bottom of the boat corresponding to a side of the processing chamber that is not surrounded by the external heater.