发明名称 CLICHE FOR OFFSET-PRINTING AND METHOD FOR MANUFACTURING SAME
摘要 The present invention relates to a cliché for offset printing and a method of manufacturing the same, and the cliché for offset printing according to the present invention comprises: a groove pattern, wherein a depth of at least a partial region of the groove pattern is different from a depth of a residual region. The present invention may comprise a double etching process when a cliché for offset printing is manufactured to control a bottom touch phenomenon that is a problem exhibited when a known wide line width is implemented, thus manufacturing the cliché for offset printing having various line widths and etching depths.
申请公布号 US2014184958(A1) 申请公布日期 2014.07.03
申请号 US201214240722 申请日期 2012.09.27
申请人 LG CHEM, LTD. 发明人 Hwang Ji Young;Koo Beom Mo
分类号 B41N1/00;B41N3/03 主分类号 B41N1/00
代理机构 代理人
主权项 1. A cliché for offset printing comprising: a groove pattern, wherein a depth of at least a partial region of the groove pattern is different from a depth of a residual region.
地址 Seoul KR