发明名称 |
INTERFERENCE EXPOSURE DEVICE AND METHOD |
摘要 |
An interference exposure device, including: a light source (100) for providing an exposure light beam; a light homogenizer-collimator (200) for homogenizing and collimating the exposure light beam; an interference unit (300) including at least two gratings (303) for converting the exposure light beam into at least two coherent light beams and making the coherent light beams converge on a substrate surface to form thereon an interference exposure pattern, the gratings (303) each having a period and being distributed in correspondence with a desired exposure pattern; a driving and supporting means (406) for supporting and carrying the substrate to move with at least three degrees of freedom; and a measuring element (500) for measuring an angle between coordinate systems of the interference unit (300) and the means (406) to adjust an exposure position of the means (406) based on a measurement result of the measuring element (500) before exposing the substrate. |
申请公布号 |
US2014176925(A1) |
申请公布日期 |
2014.06.26 |
申请号 |
US201214239515 |
申请日期 |
2012.08.16 |
申请人 |
Xu Qixin;Wang Fan |
发明人 |
Xu Qixin;Wang Fan |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
1. An interference exposure apparatus, comprising:
a light source for providing an exposure light beam; a light homogenizer-collimator for homogenizing and collimating the exposure light beam emanating from the light source; an interference unit including at least two gratings for converting the exposure light beam into at least two coherent light beams, the interference unit being movable in a vertical direction to make the at least two coherent light beams converge on a surface of a substrate to form an interference exposure pattern, the at least two gratings each having a period in correspondence with a period of a desired exposure pattern and being distributed in correspondence with a distribution characteristic of the desired exposure pattern; a driving and supporting means for supporting the substrate and carrying the substrate to move with at least three degrees of freedom; and a measuring means for measuring an angle between a coordinate system of the interference unit and a coordinate system of the driving and supporting means so as to adjust an exposure position of the driving and supporting means based on a measurement result of the measuring means before exposing the substrate. |
地址 |
Shanghai CN |