发明名称 Lithographic printing plate precursor and method of preparing lithographic printing plate
摘要 A lithographic printing plate precursor includes a support and one or more layers, one of the one or more layers is a photosensitive layer containing an initiator compound, a polymerizable compound and a binder polymer, and a layer being in contact with the support of the one or more layers contains a copolymer containing a repeating unit having a zwitterionic structure and a repeating unit having a structure capable of interacting with a surface of the support.
申请公布号 US8758975(B2) 申请公布日期 2014.06.24
申请号 US201012715605 申请日期 2010.03.02
申请人 FUJIFILM Corporation 发明人 Iwai Yu;Abe Junya;Ishiguro Yuriko;Oohashi Hidekazu
分类号 B41N1/00;G03F7/00;G03C1/00 主分类号 B41N1/00
代理机构 Sughrue Mion, PLLC 代理人 Sughrue Mion, PLLC
主权项 1. A lithographic printing plate precursor comprising a support and one or more layers, wherein one of the one or more layers is a photosensitive layer comprising an initiator compound, a polymerizable compound and a binder polymer, and a layer being in contact with the support of the one or more layers comprises a copolymer containing a repeating unit having a zwitterionic structure and a repeating unit having a structure capable of interacting with a surface of the support, wherein the zwitterionic structure is a structure represented by the following formula (I), (ii) or (iii): wherein R1 and R2 each independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heterocyclic group, or R1 and R2 may be combined with each other to form a ring structure, R3 to R7 each independently represents a hydrogen atom or a substituent, provided that at least one of R3 to R7 represents a site connecting to a main chain or side chain of the polymer, L1, L2 and L3 each independently represents a connecting group, A represents a structure having an anion, B represents a structure having a cation, and * represents a site connecting to a main chain or side chain of the polymer; and wherein the structure capable of interacting with a surface of the support is a phosphonic acid structure, a phosphonate structure, a phosphoric acid ester structure or a phosphoric acid ester salt structure; wherein the photosensitive layer is the layer being in contact with the support.
地址 Tokyo JP
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