| 摘要 |
Variations in composition in epitaxial growth of a compound semiconductor are suppressed. A wafer retainer that retains a wafer in an MOCVD device includes a carrying member that carries the wafer and a ring-like regulating member that is carried on the carrying member and regulates movement of the wafer carried on the carrying member. On a top surface of the carrying member, a wafer carrying surface for carrying the wafer and a ring carrying surface for carrying the regulating member are provided. The wafer carrying surface is formed to protrude upwardly compared to the ring carrying surface and has a convex shape in which a center portion is higher than a circumferential edge portion, and an arithmetic average roughness Ra of the wafer carrying surface is set at not more than 0.5μm. |
