| 摘要 |
In order to analyze an element to be evaluated with high sensitivity and high accuracy in a short period in an electron beam analysis device provided with a wavelength dispersive X-ray analysis unit in an electron microscope, one diffraction grating in which a plurality of patterns having maximum X-ray reflectances with respect to respective X-rays are formed is provided in an electron beam analysis device, and an X-ray serving as an energy reference and an X-ray spectrum to be evaluated are simultaneously detected. The positional displacement of X-ray energy due to the installation and change of the diffraction grating is corrected by the X-ray spectrum serving as the energy reference, thereby enabling high-sensitivity and high-accuracy analysis in a short period. |
