发明名称 Finfet structure and method to adjust threshold voltage in a finfet structure
摘要 <p>FinFET structures and methods of manufacturing the FinFET structures are disclosed. The method includes performing an oxygen anneal process on a gate stack of a FinFET structure to induce Vt shift. The oxygen anneal process is performed after sidewall pull down and post silicide.</p>
申请公布号 GB201404141(D0) 申请公布日期 2014.04.23
申请号 GB20140004141 申请日期 2012.09.14
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人
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