| 摘要 |
PROBLEM TO BE SOLVED: To enhance drawing accuracy by suppressing occurrence of beam irradiation position deviation due to a magnetic field for a sample having a magnetic film.SOLUTION: In the charged particle beam lithography method for a sample having a magnetic film, magnetic field distribution on a sample 21 is measured, positional deviation amount of a charged particle beam is calculated at each position on the sample 21 based on the measured magnetic field distribution, a position correction amount and drawing conditions for irradiating a desired position with a charged particle beam are calculated based on the calculated positional deviation amount, and then a desired pattern is drawn on the sample based on the position correction amount and drawing conditions thus calculated. |
