| 摘要 |
PROBLEM TO BE SOLVED: To provide a nano-imprint mold which has excellent dimensional accuracy of an irregular part of the nano-imprint mold including a fine irregular pattern and reduces the mold manufacturing costs, and to provide a manufacturing method of the nano-imprint mold.SOLUTION: A manufacturing method of a nano-imprint mold includes: a process where a substrate having a first main surface part formed by a plane surface is prepared; a resist pattern formation process where a protruding resist body is formed into a predetermined pattern on the first main surface part of the substrate directly or through an intermediate film; a first film part formation process where a first film part is deposited so as to cover a side surface and an upper surface of the protruding resist body, and the first main surface part of the substrate or an upper surface of the intermediate film; and an etch back process where the first film part is etched back so as to expose the upper surface of the protruding resist body, and the first main surface part of the substrate or the upper surface of the intermediate film, and leave the first film part on the side surface of the protruding resist body, thereby forming a side wall protruding part. |
