发明名称 MEMS Devices and Methods of Forming the Same
摘要 A device includes a substrate, a routing conductive line over the substrate, a dielectric layer over the routing conductive line, and an etch stop layer over the dielectric layer. A Micro-Electro-Mechanical System (MEMS) device has a portion over the etch stop layer. A contact plug penetrates through the etch stop layer and the dielectric layer. The contact plug connects the portion of the MEMS device to the routing conductive line. An escort ring is disposed over the etch stop layer and under the MEMS device, wherein the escort ring encircles the contact plug.
申请公布号 US2013277770(A1) 申请公布日期 2013.10.24
申请号 US201213450728 申请日期 2012.04.19
申请人 TSAI SHANG-YING;PENG JUNG-HUEI;HUANG HSIN-TING;HUANG YAO-TE;PAN LUNG YUAN;LIN HUNG-HUA;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 TSAI SHANG-YING;PENG JUNG-HUEI;HUANG HSIN-TING;HUANG YAO-TE;PAN LUNG YUAN;LIN HUNG-HUA
分类号 H01L29/84;H01L21/02 主分类号 H01L29/84
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