发明名称 COMPOSITIONS FOR POLISHING ALUMINUM/COPPER AND TITANIUM IN DAMASCENE STRUCTURES
摘要 PROBLEM TO BE SOLVED: To provide compositions and methods for planarizing or polishing a substrate.SOLUTION: The composition contains: an abrasive comprising alumina particles optionally treated with a polymer; an α-hydroxycarboxylic acid; an oxidizing agent that oxidizes at least one metal; polyacrylic acid; optionally, a calcium-containing compound; optionally, a biocide; optionally, a pH adjusting agent; and water. The method uses the composition to chemically-mechanically polish a substrate.
申请公布号 JP2013179360(A) 申请公布日期 2013.09.09
申请号 JP20130123913 申请日期 2013.06.12
申请人 CABOT MICROELECTRONICS CORP 发明人 VLASTA BRUSIC;THOMPSON CHRISTOPHER;JEFFREY DYSARD
分类号 H01L21/304;B24B37/00;C09K3/14 主分类号 H01L21/304
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