| 摘要 |
PROBLEM TO BE SOLVED: To provide an evaluation device capable of specifying a cause of abnormality in a repetition pattern.SOLUTION: An evaluation device 1 comprises: an illumination system 30 for irradiating linear polarization L1 onto a surface of a wafer 10 comprising a prescribed repetition pattern; a light reception system 40 for detecting a polarization state of elliptical polarization L2 which is regular reflection light from the repetition pattern irradiated with the linear polarization L1; and an image processing section 50 for evaluating a shape of the repetition pattern on the basis of the polarization state of the elliptical polarization L2 detected by the light reception system 40. |
