发明名称 |
Abrasive particles, method of manufacturing the abrasive particles, and method of manufacturing chemical mechanical polishing slurry |
摘要 |
Disclosed are abrasive particles, a method for manufacturing the abrasive particles, and a method for manufacturing a Chemical Mechanical Polishing (CMP) slurry. The method for manufacturing abrasive particles for the CMP slurry includes preparing a raw material precursor, drying the raw material precursor, and calcining the dried raw material precursor using a calcination furnace where a gas atmosphere having relatively less oxygen in comparison with an air atmosphere is created.
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申请公布号 |
US8491682(B2) |
申请公布日期 |
2013.07.23 |
申请号 |
US20080344458 |
申请日期 |
2008.12.27 |
申请人 |
HONG SUK MIN;SUH MYUNG WON;KIM YONG KUK;HWANG JOON HA;KIM JEONG YUN;KIM DONG HYUN;K.C. TECH CO., LTD. |
发明人 |
HONG SUK MIN;SUH MYUNG WON;KIM YONG KUK;HWANG JOON HA;KIM JEONG YUN;KIM DONG HYUN |
分类号 |
B24D3/02;C01F17/00 |
主分类号 |
B24D3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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