| 摘要 |
PURPOSE: A lithographic apparatus is provided to have no or low stress, to arrange a substrate on a substrate table, and to increase processing rate of a gripper. CONSTITUTION: A lithographic apparatus is a lithography apparatus to transcribe patterns onto a substrate(W) from a device. The lithography apparatus comprises a substrate table(WT) to fix the substrate; and a gripper to arrange the substrate on the substrate table. The gripper includes a vacuum clamp to clamp the substrate on the uppermost part. A handling method of a substrate comprises a step of locating the substrate on the substrate table, by using the gripper. |
