| 摘要 |
A dry etching apparatus and an etching method of an organic light emitting display device using the same are provided to set quickly the condition of an etching process and to improve the precision of etching by checking an etching rate and etching uniformity in real time. A dry etching apparatus includes a chamber, at least one power supplying device, at least one current or voltage measuring device, and a controlling unit. The chamber has a substrate stage(20) and a plurality of substrate holders(25) for fixing a substrate(100) installed on the substrate stage(20). The power supplying device is contacted with a test pattern(130) formed on the substrate(100) through an electrode installed in at least two substrate holders(25). The current or voltage measuring device is contacted with the test pattern(130) formed on the substrate(100) through the electrode installed on at least two substrate holders(25). The controlling unit outputs a resistance value by being contacted with the power supplying device and the current or voltage measuring device. |
