发明名称 Post deposition method for regrowth of crystalline phase change material
摘要 Techniques for forming a phase change memory cell. An example apparatus includes a substrate and a bottom electrode carried by the substrate. The bottom electrode is a thermal conductor. A phase change layer, including phase change material, is disposed over the bottom electrode. A thermal insulating layer is disposed above the phase change layer. A heater is configured to temporarily melt the phase change material such that the phase change material crystallizes without voids within a switching region after melting.
申请公布号 US8354659(B2) 申请公布日期 2013.01.15
申请号 US201113150705 申请日期 2011.06.01
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION;LAM CHUNG H.;ROSSNAGEL STEPHEN M.;SCHROTT ALEJANDRO G. 发明人 LAM CHUNG H.;ROSSNAGEL STEPHEN M.;SCHROTT ALEJANDRO G.
分类号 H01L29/02 主分类号 H01L29/02
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