发明名称 Semiconductor memory devices and methods of forming the same
摘要 Semiconductor memory devices and methods of forming the same are provided, the semiconductor memory devices include a first and a second buried gate respectively disposed on both inner sidewalls of a groove formed in an active portion and a device isolation pattern. The first and second buried gates are controlled independently from each other.
申请公布号 US8324673(B2) 申请公布日期 2012.12.04
申请号 US20100916998 申请日期 2010.11.01
申请人 CHUNG HYUN-WOO;KIM KANG-UK;OH YONGCHUL;KIM HUI-JUNG;KIM HYUN-GI;SAMSUNG ELECTRONICS CO., LTD. 发明人 CHUNG HYUN-WOO;KIM KANG-UK;OH YONGCHUL;KIM HUI-JUNG;KIM HYUN-GI
分类号 H01L27/108 主分类号 H01L27/108
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