发明名称 CURABLE RESIN COMPOSITION FOR NANOIMPRINT
摘要 <P>PROBLEM TO BE SOLVED: To provide: a curable resin composition excellent in releasability, and further having low warpage property, low reflectance and excellent scratch resistance; a cured material of the curable resin composition; an article having a fine irregular structure and comprising the cured material of the curable resin composition; and an antireflection plate. <P>SOLUTION: A curable resin composition for nanoimprint contains a vinyl polymer having a repeating unit represented by the following formula (1) (in the formula, R<SP POS="POST">1</SP>represents an alkylene group having 2-8 carbon atoms, R<SP POS="POST">2</SP>represents a hydrogen atom or a methyl group, and m represents a positive integer). <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012227190(A) 申请公布日期 2012.11.15
申请号 JP20110090625 申请日期 2011.04.15
申请人 NIPPON SHOKUBAI CO LTD 发明人 KAWADA YUICHI;MIYAI TAKASHI
分类号 H01L21/027;B82Y30/00;C08F16/32;C08F261/06;G02B1/11;H01J5/16 主分类号 H01L21/027
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