| 摘要 |
PURPOSE: A substrate processing apparatus is provided to shorten the length of a process chamber by using a space of a transfer chamber as a substrate standby space of a process chamber. CONSTITUTION: A substrate is processed in a process chamber. A mask stoker(50) is connected to one side of the process chamber and supplies a mask to the process chamber. A buffer chamber(20) is connected to the other side of the process chamber. A transfer chamber(30) is formed in the buffer chamber, performs the step movement, and exchanges the process chamber and the substrate. A moving unit performs the step movement of the transfer chamber in the buffer chamber. A sealing unit connects the transfer chamber to the process chamber with an air current type. |
