发明名称 |
EUV RADIATION SOURCE COMPRISING A DROPLET ACCELARATOR AND LITHOGRAPHY APPARATUS |
摘要 |
An EUV radiation source includes a fuel supply configured to supply fuel to a plasma formation location. The fuel supply includes a nozzle configured to eject droplets of fuel, and a droplet accelerator configured to accelerate the fuel droplets. The EUV radiation source includes a laser radiation source configured to irradiate the fuel supplied by the fuel supply at the plasma formation location. |
申请公布号 |
KR20120112521(A) |
申请公布日期 |
2012.10.11 |
申请号 |
KR20127017646 |
申请日期 |
2010.11.29 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
MESTROM WILBERT;LOOPSTRA ERIK;SWINKELS GERARDUS;BUURMAN ERIK |
分类号 |
H05G2/00;G03F7/20;G21K5/00;H01L21/027 |
主分类号 |
H05G2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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