发明名称 Laser heated discharge plasma EUV source
摘要 A self-magnetically confined lithium plasma which also may have an applied axial magnetic field is irradiated at sub-critical density by a carbon dioxide laser to generate extreme ultraviolet photons at the wavelength of 13.5 nm with high efficiency, high power and small source size.
申请公布号 US8269199(B2) 申请公布日期 2012.09.18
申请号 US20080277623 申请日期 2008.11.25
申请人 MCGEOCH MALCOLM W.;PLEX LLC 发明人 MCGEOCH MALCOLM W.
分类号 G21K5/02 主分类号 G21K5/02
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