| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sputtering target for forming a film of a magnetic recording medium that allows deposition of a film with low ordering temperature while suppressing generation of particles, and a method for manufacturing the same. <P>SOLUTION: A sputtering target for forming a film of a magnetic recording medium is composed of a sintered body having a composition expressed with a general formula: ä(Fe<SB POS="POST">x</SB>Pt<SB POS="POST">100-x</SB>)<SB POS="POST">(100-y)</SB>A<SB POS="POST">y</SB>}<SB POS="POST">(100-z)</SB>C<SB POS="POST">z</SB>, in which A represents a metal made of at least one of Au and Cu, and 30≤x≤80, 1≤y≤30 and 3≤z≤63 in atomic ratio are satisfied. Further, a method for manufacturing this sputtering target includes a step of hot-pressing, in vacuum or an inert gas atmosphere, mixed powder of: at least one of AuPt alloy powder and CuPt alloy powder; AgPt alloy powder; FePt alloy powder; Pt powder; and graphite powder or carbon black powder. <P>COPYRIGHT: (C)2012,JPO&INPIT |
