| 摘要 |
An exposure apparatus can mitigate the impact of fluctuations in the refractiveindex of ambient gas, and improve, for example, stage positioning accuracy. An exposure apparatus radiates an exposure illumination light to a wafer (W) on a wafer stage (WST) through a projection optical system (PL), and forms a prescribed pattern onthe wafer (W), and comprises: a scale, which is provided to the wafer stage (WST); a plurality of X heads (66), which detect information related to the position of the scale; a measurement frame (21) that integrally supports the plurality of X heads (66) and has a coefficient of linear thermal expansion that is smaller than that of the main body of thewafer stage (WST); and a control apparatus that derives information related to thedisplacement of the wafer stage (WST) based on the detection results of the plurality of X heads (66). Figure 1 |
