发明名称 |
METHOD OF CONTROLING SUBSTRATE PROCESSING APPARATUS |
摘要 |
PURPOSE: A method for controlling a substrate processing device is provided to perform liquid crystal printing of various patterns and control the amount of discharging liquid crystals. CONSTITUTION: First nozzles are located on upper areas of cells. Liquid crystals are discharged from the first nozzles. A liquid crystal printing head moves in a second direction. An existing nozzle is located in an upper area of a second cell adjacent to a first cell in the second direction(S150). Second nozzles are located in upper areas of the cells. Liquid crystals are discharged from the second nozzles(S160). |
申请公布号 |
KR20120090422(A) |
申请公布日期 |
2012.08.17 |
申请号 |
KR20110010841 |
申请日期 |
2011.02.08 |
申请人 |
SEMES CO., LTD. |
发明人 |
OH, BEOM JEONG;NAM, KI SEON |
分类号 |
G02F1/1341;B05C5/02;G02F1/13 |
主分类号 |
G02F1/1341 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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