发明名称 METHOD OF CONTROLING SUBSTRATE PROCESSING APPARATUS
摘要 PURPOSE: A method for controlling a substrate processing device is provided to perform liquid crystal printing of various patterns and control the amount of discharging liquid crystals. CONSTITUTION: First nozzles are located on upper areas of cells. Liquid crystals are discharged from the first nozzles. A liquid crystal printing head moves in a second direction. An existing nozzle is located in an upper area of a second cell adjacent to a first cell in the second direction(S150). Second nozzles are located in upper areas of the cells. Liquid crystals are discharged from the second nozzles(S160).
申请公布号 KR20120090422(A) 申请公布日期 2012.08.17
申请号 KR20110010841 申请日期 2011.02.08
申请人 SEMES CO., LTD. 发明人 OH, BEOM JEONG;NAM, KI SEON
分类号 G02F1/1341;B05C5/02;G02F1/13 主分类号 G02F1/1341
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